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X-Ray Diffraction
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  • GNR is a worldwide market leader in supplying advanced X-ray (XRD, XRF) and optical emission spectrometer (OES ) systems for complete solutions in structural and elemental analysis.
  • We can fit well the analytical needs of customers in material research, quality control, process analysis and life science. These analytical methods provide elemental composition of solids and liquids as well as structural parameters of powders, thin films and bulk materials.
  • The EXPLORER high resolution diffraction system incorporates the high efficiency of the direct drive torque motors controlled by optical encoders, allowing to reach an angular accuracy of 0.00001°.
  • The modularity and the flexibility of the GNRX-ray equipmentsallows to start with an entry-level system which can be upgraded tomeet new requirements.
  • We can supply a wide range of X-ray sources,optics, sample holders, detectors andconfigurations to satisfy all the analyticalneeds.
  • With no limits to its applications, EXPLORERmodular system offers high performancesin all analytical areas, ranging from phasesquantification of mixtures, to the determinationof microstructural properties as residualstress and preferred orientation ofcrystallites on bulk materials as well as onthin films.
  • The combination of direct drive torque motorswith optical encoders ensures fast andextremely accuracy of the drives.
  • EXPLORER offers solutions for a wide rangeof analytical requirements, from routinecrystalline phase identification and quantification,crystallite size/lattice strain andcrystallinity calculations, retained austenitequantification, polymorph screening, crystalstructures analysis, to residual-stress analysis,thin films, depth profiling, non-ambientanalyses, phase transition textures and preferredorientation, nanoparticles.
  • The optics permit switches between Bragg-Brentano, focusing and parallel beam geometryusing Johansson or parabolic mirrormonochromators.
  • The high resolution reflectometry studiescan be performed with EXPLO RER to characteriselayer thickness (from 1 to 500 nmwith an accuracy better than 1%), density(with an accuracy better than ± 0.03 g/cm3),surface and interface roughness (from 0 to5 nm with an accuracy better than ± 0.1nm).
  • Measurements at low angles and a thin filmattachment for parallel beam geometry allowthe study of thin films and multilayers.The coupling between a parabolic mirrormonochromator and a channel-cut crystalmounted on the incident beam allows to realisea monochromatic parallel beam withhigh intensity and low divergence, suitablefor high resolution measurements.
  • Powerful, user-friendly software makesmeasurement easier than ever and includesmany sophisticated features to aid the interpretationof the results.

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